Smooth layer for reducing roughness of EUV/soft x-ray multilayer substrate

被引:0
作者
Zhang, Li-Chao
Jin, Chun-Shui
机构
[1] State Key Lab. of Applied Optics, Changchun Institute of Optics and Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
[2] Graduate School, Chinese Academy of Sciences, Beijing 100039, China
来源
Weixi Jiagong Jishu/Microfabrication Technology | 2007年 / 03期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
8
引用
收藏
页码:27 / 29
相关论文
empty
未找到相关数据