Wafer surface measuring system

被引：0
|
作者：
Anon
机构：
来源：
Semiconductor International | 2001年 / 24卷 / 06期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Measuring wafer surface temperature during ion implant
    Rio, Valentin
    Moore, Gerry
    1600, Cahners Publ Co, Des Plaines, IL, United States (18):
  • [2] Measurement of nanodefects on Si wafer surface using system for measuring particle diameter by light-scattering method
    Sasaki, Satoshi
    Hiroshi, A.N.
    Mori, Yuzo
    Kataoka, Tosihiko
    Endo, Katsuyoshi
    Yamauchi, Kazuto
    Inoue, Haruyuki
    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 2002, 68 (09): : 1200 - 1205
  • [3] Method for measuring the granite surface topography of wafer stage with laser interferometer
    He, L
    Wang, XZ
    Shi, WJ
    Hu, JM
    2ND INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, PTS 1 AND 2, 2006, 6150
  • [4] Investigation of a Standard Particle Deposition System on Wafer Surface and Its Application to Wafer Cleaning
    Cho, Younsun
    Hong, Seokjun
    Lee, Seungjae
    Yang, Jichul
    Chae, Seung-Ki
    Kim, Taesung
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2019, 8 (12) : P768 - P774
  • [5] Measuring height variation over entire wafer surface with high lateral resolution
    Tang, Shouhong
    Clendenin, Brian
    ADVANCED CHARACTERIZATION TECHNIQUES FOR OPTICS, SEMICONDUCTORS, AND NANOTECHNOLOGIES III, 2007, 6672
  • [6] NEW IRREGULAR SURFACE MEASURING SYSTEM
    DEUTSCH, SJ
    WU, SM
    STRAKLOW.CM
    INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, 1973, 13 (01): : 29 - 42
  • [7] A measuring system for surface roughness parameters
    Han Jinhong
    Wang yunkai
    Zhang xianfeng
    THIRD INTERNATIONAL SYMPOSIUM ON PRECISION MECHANICAL MEASUREMENTS, PTS 1 AND 2, 2006, 6280
  • [8] AN ACCURATE SURFACE TEMPERATURE MEASURING SYSTEM
    ROBERTSON, D
    STERBUTZEL, GA
    IEEE TRANSACTIONS ON INDUSTRY AND GENERAL APPLICATIONS, 1970, IGA6 (01): : 43 - +
  • [9] Standard Measuring Device for Thickness of Silicon Wafer Based on Laser Compensation System
    Zeng, Yan-hua
    Fu, Yun-xia
    Tang, Dong-mei
    Zhu, Yi-qing
    2017 4TH INTERNATIONAL CONFERENCE ON SYSTEMS AND INFORMATICS (ICSAI), 2017, : 1733 - 1737
  • [10] System design for improving the detection effect of wafer surface particles
    Chen, Gengyang
    He, Pan
    JOURNAL OF OPTICS, 2025, 27 (02)
12345