Room temperature deposition of amorphous TiO2 film by pulsed bias arc ion plating

被引：0
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作者：
Zhang, Min [1 ]
Lin, Guoqiang [1 ]
Dong, Chuang [1 ]
Wen, Lishi [1 ]
机构：
[1] State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
来源：
Jinshu Xuebao/Acta Metallurgica Sinica | 2007年 / 43卷 / 05期
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页码：509 / 514
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