Room temperature deposition of amorphous TiO2 film by pulsed bias arc ion plating

被引：0
|
作者：
Zhang, Min [1 ]
Lin, Guoqiang [1 ]
Dong, Chuang [1 ]
Wen, Lishi [1 ]
机构：
[1] State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
来源：
Jinshu Xuebao/Acta Metallurgica Sinica | 2007年 / 43卷 / 05期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：509 / 514
相关论文
共 50 条
  • [1] Room temperature deposition of amorphous TiO2 film by pulsed bias arc ion plating
    Zhang Min
    Lin Guoqiang
    Dong Chuang
    Wen Lishi
    ACTA METALLURGICA SINICA, 2007, 43 (05) : 509 - 514
  • [2] Amorphous TiO2 films with high refractive index deposited by pulsed bias arc ion plating
    Zhang, Min
    Lin, Guoqiang
    Dong, Chuang
    Wen, Lishi
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (16-17): : 7252 - 7258
  • [3] Substrate temperature calculation for pulsed bias arc ion plating
    Lin, GQ
    Bai, X
    Dong, C
    Lishi, W
    Wen, LH
    SURFACE & COATINGS TECHNOLOGY, 2005, 194 (2-3): : 325 - 329
  • [4] Photocatalytic TiO2 film prepared using arc ion plating
    Chang, JT
    Su, CW
    He, JL
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (09): : 3027 - 3034
  • [5] Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating
    Li Ming-sheng
    Zhang Shu-juan
    Lou Jin
    Liu Ting-zhi
    Zhou Ze-hua
    Yang Gan-lan
    Hu Chang-yuan
    Li Wen-kui
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2007, 17 : S827 - S830
  • [6] Deposition of photocatalytic TiO2 and N-doped TiO2 films by arc ion plating
    李明升
    张淑娟
    娄瑾
    刘庭芝
    周泽华
    杨干兰
    胡长员
    李文魁
    Transactions of Nonferrous Metals Society of China, 2007, (S1) : 827 - 830
  • [7] Effect of pulsed bias on TiN film deposition on internal wall of deep tubes by arc ion plating
    Shi, Changlun
    Zhang, Min
    Lin, Guoqiang
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2007, 27 (06): : 517 - 521
  • [8] Calculation on deposited temperature during pulsed bias arc ion plating
    Bai, X
    Lin, GQ
    Dong, C
    Wen, LS
    ACTA METALLURGICA SINICA, 2004, 40 (10) : 1069 - 1073
  • [9] Effect of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating and simulation of pulsed plasma sheath dynamics
    Zhang, Min
    Liu, Lei
    Yang, Xiaoxu
    Xu, Feifei
    Lin, Guoqiang
    Dong, Chuang
    THIN SOLID FILMS, 2012, 521 : 7 - 11
  • [10] Influence of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating: Experimental and simulation study
    Zhang, Min
    Liu, Lei
    Yang, Xiaoxu
    Xu, Feifei
    Liu, Chengsen
    Gong, Faquan
    Li, Mengke
    SURFACE & COATINGS TECHNOLOGY, 2013, 229 : 186 - 190
12345