Plasma Diagnostics in Pulsed Plasma Doping System

被引：0
作者：
Varian Semiconduct. Equip. Assoc., 35 Dory Road, Gloucester, MA 01930, United States [1 ]
不详 [2 ]
不详 [3 ]
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来源：
Plasma Science and Applications Committee of IEEE | 1600年 / 263卷 / 2003期
关键词：
Compendex;
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摘要：
Doping (additives) - Ion implantation - Laser applications - Plasma etching - Rapid thermal annealing - Semiconductor devices - Silicon wafers
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