Plasma Diagnostics in Pulsed Plasma Doping System

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作者：

Varian Semiconduct. Equip. Assoc., 35 Dory Road, Gloucester, MA 01930, United States ^{[1
]}

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]}

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]}

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来源：

Plasma Science and Applications Committee of IEEE | 1600年 / 263卷 / 2003期

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Compendex;

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摘要：

Doping (additives) - Ion implantation - Laser applications - Plasma etching - Rapid thermal annealing - Semiconductor devices - Silicon wafers

引用

共 50 条

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