Plasma Diagnostics in Pulsed Plasma Doping System

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Varian Semiconduct. Equip. Assoc., 35 Dory Road, Gloucester, MA 01930, United States [1 ]
不详 [2 ]
不详 [3 ]
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Plasma Science and Applications Committee of IEEE | 1600年 / 263卷 / 2003期
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摘要：
Doping (additives) - Ion implantation - Laser applications - Plasma etching - Rapid thermal annealing - Semiconductor devices - Silicon wafers
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