Composition distribution of compound oxide films deposited by magnetron sputtering

被引：0
|
作者：
机构：
[1] Konishi, Yoshinori
[2] Harada, Keiko
[3] Yonezawa, Yoshiyuki
[4] Kawamura, Yukinori
来源：
Konishi, Yoshinori | 1600年 / JJAP, Tokyo卷 / 39期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films
    Jun DU~+ Ping ZHANG National Key Laboratory for Remanufacturing
    JournalofMaterialsScience&Technology, 2007, (04) : 571 - 573
  • [42] The Composition Analysis and Prediction of Fe-Ga Alloy Films Deposited by Magnetron Sputtering
    Yan, Jian-wu
    Cha, Ying-peng
    Li, Qin-peng
    3RD INTERNATIONAL CONFERENCE ON APPLIED MECHANICS AND MECHANICAL AUTOMATION (3RD AMMA 2017), 2017, : 287 - 292
  • [43] Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering
    Baker, Alexander A.
    Engwall, Alison M.
    Bayu-Aji, Leonardus Bimo
    Bae, John H.
    Shin, Swanee J.
    Moody, John D.
    Kucheyev, Sergei O.
    COATINGS, 2022, 12 (07)
  • [44] Composition, microstructure, and properties of CrNx films deposited using medium frequency magnetron sputtering
    Kong, Qinghua
    Ji, Li
    Li, Hongxuan
    Liu, Xiaohong
    Wang, Yongjun
    Chen, Jianmin
    Zhou, Huidi
    APPLIED SURFACE SCIENCE, 2011, 257 (06) : 2269 - 2274
  • [45] Low resistivity indium tin oxide films deposited by unbalanced DC magnetron sputtering
    Natl. Inst. of Technol. and Quality, -City, Kwachun, Korea, Republic of
    不详
    不详
    Thin Solid Films, 1 (225-229):
  • [46] Influence of Substrate Temperature on the Characteristics of Zinc Oxide Thin Films Deposited by Magnetron Sputtering
    Gu, J. H.
    Zhong, Z. Y.
    He, X.
    Hou, J.
    Yang, C. Y.
    PROGRESS IN NEW MATERIALS AND MECHANICS RESEARCH, 2012, 502 : 111 - +
  • [47] Low resistivity indium tin oxide films deposited by unbalanced DC magnetron sputtering
    Shin, SH
    Shin, JH
    Park, KJ
    Ishida, T
    Tabata, O
    Kim, HH
    THIN SOLID FILMS, 1999, 341 (1-2) : 225 - 229
  • [48] Cadmium tin oxide thin films deposited by RF magnetron sputtering for photovoltaic applications
    Meng, Tiejun
    McCandless, Brian
    Buchanan, Wayne
    Kimberly, Evan
    Birkmire, Robert
    JOURNAL OF ALLOYS AND COMPOUNDS, 2013, 556 : 39 - 44
  • [49] Physical Properties of Tin Oxide Thin Films Deposited using Magnetron Sputtering Technique
    Lim, Huey Sia
    Nayan, Nafarizal
    Sahdan, Mohd Zainizan
    Dahlan, Samsul Haimi
    Suaidi, Mohd Kadim
    Johar, Fauzi Mohd
    Kiani, Ghaffer I.
    2013 IEEE REGIONAL SYMPOSIUM ON MICRO AND NANOELECTRONICS (RSM 2013), 2013, : 356 - 359
  • [50] Titanium oxide thin films deposited by high-power impulse magnetron sputtering
    Konstantinidis, S.
    Dauchot, J. P.
    Hecq, A.
    THIN SOLID FILMS, 2006, 515 (03) : 1182 - 1186
12345