Pattern formation on ion-irradiated Si surface at energies where sputtering is negligible

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[1] Lopez-Cazalilla, A.
[2] Chowdhury, D.
[3] Ilinov, A.
[4] 2,Mondal, S.
[5] 2,Barman, P.
[6] Bhattacharyya, S.R.
[7] Ghose, D.
[8] 1,Djurabekova, F.
[9] Nordlund, K.
[10] Norris, S.
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Lopez-Cazalilla, A. (alvaro.lopezcazalilla@helsinki.fi) | 1600年 / American Institute of Physics Inc.卷 / 123期
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