Characterized optical constants of thin films for vacuum ultraviolet lithography applications

被引：0

作者：

Fan, W. ^{[1
]}

Chen, H.L. ^{[1
]}

Wu, C.L. ^{[2
]}

Chang, L.K.S. ^{[2
]}

机构：

[1] Nat. Nano Device Lab., 1001-1 Ta Hsueh Road, Hsinchu, Taiwan

[2] Institute of Engineering and System Science, National Tsing Hua University, Hsinchu, Taiwan

来源：

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | 2003年

关键词：

Compendex;

D O I：

1268507

中图分类号：

学科分类号：

摘要：

Nanotechnology - Thin films - Optical films - Vacuum applications - Optical constants

引用

页码：38 / 39