Megasonic, non-contact cleaning followed by 'Rotagoni' drying of CMP wafers

被引：0
作者：
Lauerhaas, Jeff [1 ]
Mertens, Paul W. [2 ]
Nicolosi, Tom [3 ]
Kenis, Karine [2 ]
Fyen, Wim [2 ]
Heyns, Marc [2 ]
机构：
[1] IMEC VZW Indust. Resident Verteq, I., Kapeldreef 75, BE-3001 Heverlee, Belgium
[2] IMEC VZW, Kapeldreef 75, BE-3001 Leuven, Belgium
[3] Verteq, Inc., 1241 E. Dyer Road, Santa Ana, CA 92705, United States
来源：
Solid State Phenomena | 2000年 / 76-77卷
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摘要：
21
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页码：251 / 254
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