Kinetic simulation of discharge excited ArF excimer laser and parameter analysis

被引：1

作者：

Luo, Shiwen ^{[1
]}

Zuo, Duluo ^{[1
]}

Wang, Xinbing ^{[1
]}

机构：

[1] Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2015年 / 27卷 / 08期

关键词：

Electric fields - Excimer lasers - Fluorine - Timing circuits - Photons - Fluorine compounds;

D O I：

10.11884/HPLPB201527.081006

中图分类号：

学科分类号：

摘要：

A one-dimensional fluid model is used to investigate the kinetics of discharge excited ArF excimer laser. Voltage-current waveforms of the gas discharge process coupling with the discharge circuit are obtained. Temporal-spatial evolution of electron number density, photon number density and electric field are obtained and influence of discharge parameters on the laser output is analyzed. The results show that circuit parameters, pressure and fluorine gas ratio all have significant influence on laser output. The inductance has little influence on the output which result in a large parameter set. Low peaking capacitance is beneficial to long pulse and too high or too low pressure and fluorine gas ratio result in small output. ©, 2015, Editorial Office of High Power Laser and Particle Beams. All right reserved.

引用

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