Kinetic simulation of discharge excited ArF excimer laser and parameter analysis

被引:1
|
作者
Luo, Shiwen [1 ]
Zuo, Duluo [1 ]
Wang, Xinbing [1 ]
机构
[1] Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China
关键词
Electric fields - Excimer lasers - Fluorine - Timing circuits - Photons - Fluorine compounds;
D O I
10.11884/HPLPB201527.081006
中图分类号
学科分类号
摘要
A one-dimensional fluid model is used to investigate the kinetics of discharge excited ArF excimer laser. Voltage-current waveforms of the gas discharge process coupling with the discharge circuit are obtained. Temporal-spatial evolution of electron number density, photon number density and electric field are obtained and influence of discharge parameters on the laser output is analyzed. The results show that circuit parameters, pressure and fluorine gas ratio all have significant influence on laser output. The inductance has little influence on the output which result in a large parameter set. Low peaking capacitance is beneficial to long pulse and too high or too low pressure and fluorine gas ratio result in small output. ©, 2015, Editorial Office of High Power Laser and Particle Beams. All right reserved.
引用
收藏
相关论文
共 50 条
  • [21] SPECTRAL TUNING OF AN ARF EXCIMER LASER
    YE, C
    YUAN, CL
    SHANGGUAN, C
    DOU, AR
    CHINESE PHYSICS, 1982, 2 (01): : 230 - 231
  • [22] ARF EXCIMER LASER PROJECTION LITHOGRAPHY
    NAKAGAWA, H
    SASAGO, M
    TANI, Y
    ENDO, M
    KOGA, K
    HIRAI, Y
    NOMURA, N
    1989 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS, 1989, : 9 - 10
  • [23] Performance improvement of a discharge-pumped ArF excimer laser by xenon gas addition
    Kataoka, N
    Itagaki, M
    Uchino, K
    Muraoka, K
    Takahashi, A
    Okada, T
    Maeda, M
    Hori, T
    Terashima, K
    Sumitani, A
    Enami, T
    Mizoguchi, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (12A): : 6735 - 6738
  • [24] Theoretical studies on energy loss processes in a discharge-pumped ArF excimer laser
    Furuhashi, H
    Yamada, J
    Uchida, Y
    SELECTED PAPER FROM INTERNATIONAL CONFERENCE ON OPTICS AND OPTOELECTRONICS '98: SILVER JUBILEE SYMPOSIUM OF THE OPTICAL SOCIETY OF INDIA, 1999, 3729 : 273 - 277
  • [25] Development of pellicle for ArF excimer laser
    Shigematsu, S
    Eda, A
    Nakagawa, H
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 405 - 419
  • [26] Pellicle for ArF excimer laser photolithography
    Sakurai, I
    Shirasaki, T
    Kashida, M
    Kubota, Y
    PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 177 - 187
  • [27] Measurement of temporal behavior of electron density in a discharge-pumped ArF excimer laser
    Nagai, S
    Furuhashi, H
    Kono, A
    Uchida, Y
    Goto, T
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1998, 34 (06) : 942 - 948
  • [28] TIME-RESOLVED ELECTRON-DENSITY MEASUREMENTS IN AN ARF EXCIMER LASER DISCHARGE
    MOCHIZUKI, T
    HIRATA, K
    NINOMIYA, H
    NAKAMURA, K
    MAEDA, K
    HORIGUCHI, S
    FUJIWARA, Y
    OPTICS COMMUNICATIONS, 1989, 72 (05) : 302 - 305
  • [29] Luminescence of Al2O3 crystal modifications excited by the ArF excimer laser
    V. N. Snytnikov
    V. O. Stoyanovskii
    V. A. Ushakov
    V. N. Parmon
    Kinetics and Catalysis, 2005, 46 : 260 - 268
  • [30] Luminescence of Al2O3 crystal modifications excited by the ArF excimer laser
    Snytnikov, VN
    Stoyanovskii, VO
    Ushakov, VA
    Parmon, VN
    KINETICS AND CATALYSIS, 2005, 46 (02) : 260 - 268