Self-assembled monolayer of triazole-thione derivatives and its electrochemical property of corrosion resistance of hydrochloric acid

被引：0
作者：
Liu Q. [1 ]
Liu G.-Y. [1 ]
Niu X.-X. [1 ]
Qu X.-Y. [1 ]
机构：
[1] School of Chemistry and Chemical Engineering, Central South University, Changsha
来源：
Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals | 2019年 / 29卷 / 05期
基金：
中国国家自然科学基金;
关键词：
Copper corrosion inhibition; Cyclic voltammetry (CV); Electrochemical impedance spectroscopy (EIS); Hexyl triazole-thione; Self-assembled monolayer(SAM); Tafel polarization curve;
D O I：
10.19476/j.ysxb.1004.0609.2019.5.24
中图分类号：
学科分类号：
摘要：
The electrochemical properties of the self-assembled monolayer(SAM) of 3-hexyl-4-amino-1,2,4-triazole- 5-thione (HATT) or 5-hexyl-1,2,4-triazole-3-thione (HXTT) on copper surfaces were investigated by electrochemical impedance spectroscopy (EIS), Tafel polarization curve and cyclic voltammetry (CV). The results show that the SAM of HATT or HXTT exhibits the excellent resistance to copper corrosion. And the SAM formed on copper surfaces by 5×10-5 mol/L HATT or HXTT treatment of 24 h reaches corrosion inhibition efficiency of 97.33% or 95.51% to copper in 0.5 mol/L hydrochloric acid solution, respectively. The self-assembly mechanism of HATT or HXTT on copper surfaces was further evaluated by contact angle, adsorption thermodynamics and X-ray photoelectron spectra. The result indicates that HATT and HXTT chemisorbed on copper surfaces through bonding their N and S atoms with surface copper atoms to generate Cu(I) complexes. The closely arranged SAM might obstruct the corrosion particles, such as Cl- ions to diffuse to copper surfaces, resulting in corrosion inhibition. Moreover, the alkyl of the SAM faces to aqueous solutions to convert copper surfaces from hydrophilicity to hydrophobicity. © 2019, Science Press. All right reserved.
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页码：1102 / 1117
页数：15
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