Ab initio calculations of B diffusion in SiC

被引：0

作者：

Rurali, R. ^{[1
,2
]}

Hernaández, E. ^{[2
]}

Godignon, P. ^{[1
]}

Rebollo, J. ^{[1
]}

Ordejoán, P. ^{[2
]}

机构：

[1] Centre Nacional de Microelectrònica, CNM-CSIC, Campus de la UAB, ES-08193 Bellaterra, Barcelona, Spain

[2] Instituto de Ciència de Materials de Barcelona ICMAB-CSIC, Campus de la UAB, ES-08193 Bellaterra, Barcelona, Spain

来源：

Materials Science Forum | 2002年 / 389-393卷 / 01期

关键词：

D O I：

10.4028/www.scientific.net/msf.389-393.553

中图分类号：

学科分类号：

摘要：

引用

页码：553 / 556

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