Influence of substrate roughness on the formation of aliphatic self-assembled monolayers (SAMs) on silicon(100)

被引：0
|
作者：
Moré, Sam Dylan [1 ]
Graaf, Harald [1 ]
Baune, Michael [2 ]
Wang, Changshun [1 ]
Urisu, Tsuneo [1 ,3 ]
机构：
[1] Department of Vacuum UV Photoscience, Institute for Molecular Science, Myodaiji, Okazaki, 444-8585, Japan
[2] Institute of Applied Physical Chemistry, AG Chemische Synergetic, Bremen University, Postfach, 28334 Bremen, Germany
[3] Graduate University for Advanced Studies, Institute for Molecular Science, Myodaiji, Okazaki, 444-8585, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期
关键词：
Gauche-disordered phases;
D O I：
10.1143/jjap.41.4390
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：4390 / 4394
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