Charge-state control of phosphorus donors in silicon-on-insulator metal-oxide-semiconductor field-effect transistor

被引:0
|
作者
Ono, Yukinori [1 ]
Nishiguchi, Katsuhiko [1 ]
Inokawa, Hiroshi [1 ]
Horiguchi, Seiji [2 ]
Takahashi, Yasuo [3 ]
机构
[1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
[2] Department of Electrical and Electronic Engineering, Faculty of Engineering and Resource Science, Akita University, 1-1 Tegata-gakuen-machi, Akita-shi, Akita 010-8502, Japan
[3] Graduate School of Information Science and Technology, Hokkaido University, Sapporo, Hokkaido 060-0814, Japan
关键词
Compendex;
D O I
暂无
中图分类号
学科分类号
摘要
Diffusion - Fabrication - Gates (transistor) - Interfaces (materials) - MOSFET devices - Silicon - Silicon on insulator technology - Substrates
引用
收藏
相关论文
共 50 条
  • [21] Effect of channel positioning on the 1/f noise in silicon-on-insulator metal-oxide-semiconductor field-effect transistors
    von Haartman, Martin
    Ostling, Mikael
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)
  • [22] A new silicon-on-insulator structure of metal-oxide-semiconductor field effect transistor to reduce self-heating effect
    Lin, Q
    Zhang, ZX
    Zhu, M
    Xie, XY
    Song, HQ
    Lin, CL
    CHINESE PHYSICS LETTERS, 2003, 20 (01): : 158 - 160
  • [23] BALLISTIC METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
    NATORI, K
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (08) : 4879 - 4890
  • [24] Modeling of a triple reduced surface field silicon-on-insulator lateral double-diffused metal-oxide-semiconductor field-effect transistor with low on-state resistance
    Wang, Yu-Ru
    Liu, Yi-He
    Lin, Zhao-Jiang
    Fang, Dong
    Li, Cheng-Zhou
    Qiao, Ming
    Zhang, Bo
    CHINESE PHYSICS B, 2016, 25 (02)
  • [25] Strongly Correlated Charge Transport in Silicon Metal-Oxide-Semiconductor Field-Effect Transistor Quantum Dots
    Seo, M.
    Roulleau, P.
    Roche, P.
    Glattli, D. C.
    Sanquer, M.
    Jehl, X.
    Hutin, L.
    Barraud, S.
    Parmentier, F. D.
    PHYSICAL REVIEW LETTERS, 2018, 121 (02)
  • [26] Effect of buried oxide thickness in a thin-film silicon on insulator power metal-oxide-semiconductor field-effect transistor
    Matsumoto, Satoshi
    Yachi, Toshiaki
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (6 A): : 3438 - 3442
  • [27] Effect of buried oxide thickness in a thin-film silicon on insulator power metal-oxide-semiconductor field-effect transistor
    Matsumoto, S
    Yachi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (6A): : 3438 - 3442
  • [28] CURRENT-VOLTAGE CHARACTERISTICS OF SILICON-ON-INSULATOR METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS IN BALLISTIC MODE
    NATORI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B): : 554 - 557
  • [29] Analysis and Modeling of Geometry Dependent Thermal Resistance in Silicon-on-Insulator Metal-Oxide-Semiconductor Field-Effect Transistors
    Zhou, Xingye
    Inoue, Takuya
    Kitamura, Masashi
    Matsuura, Kai
    Miyake, Masataka
    Iizuka, Takahiro
    Umeda, Takuya
    Kikuchihara, Hideyuki
    Mattausch, Hans Juergen
    He, Jin
    Miura-Mattausch, Mitiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (04)
  • [30] Evidence for mobility enhancement in double-gate silicon-on-insulator metal-oxide-semiconductor field-effect transistors
    Rodriguez, N.
    Cristoloveanu, S.
    Gamiz, F.
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (08)