Recombination defects at the 4H-SiC/SiO2 interface investigated with electrically detected magnetic resonance and ab initio calculations

被引:0
|
作者
机构
[1] Cottom, J.
[2] Gruber, G.
[3] Pobegen, G.
[4] Aichinger, T.
[5] Shluger, A.L.
来源
| 1600年 / American Institute of Physics Inc.卷 / 124期
关键词
Number:; EP/G036675/1; EP/L000202/1; Acronym:; EPSRC; Sponsor: Engineering and Physical Sciences Research Council; EP/L000202; RPG-2016-135; -; Sponsor: Leverhulme Trust;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] The Effects of Phosphorus at the SiO2/4H-SiC Interface
    Sharma, Y. K.
    Ahyi, A. C.
    Issacs-Smith, T.
    Shen, X.
    Pantelides, S. T.
    Zhu, X.
    Rozen, J.
    Feldman, L. C.
    Williams, J. R.
    Xu, Yi
    Garfunkel, E.
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 743 - +
  • [22] Reaction of NO molecule at 4H-SiC/SiO2 interface: an ab initio study for the effect of NO annealing after dry oxidation
    Shimizu, Tsunashi
    Akiyama, Toru
    Nakamura, Kohji
    Ito, Tomonori
    Kageshima, Hiroyuki
    Uematsu, Masashi
    Shiraishi, Kenji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 60 (SB)
  • [23] Ab initio study for orientation dependence of nitrogen incorporation at 4H-SiC/SiO2 interfaces
    Akiyama, Toru
    Shimizu, Tsunashi
    Ito, Tomonori
    Kageshima, Hiroyuki
    Chokawa, Kenta
    Shiraishi, Kenji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SH)
  • [24] Effect of hydrogenation on the dangling-bond free 4H-SiC(1120)/SiO 2 interface studied by ab initio calculations
    Research Laboratory, Denso Corporation, 500-1 Minamiyama, Komenoki-cho, Nisshin, Aichi 470-0111, Japan
    不详
    Appl. Phys. Express, 1882, 8
  • [25] Electron-spin-resonance and electrically detected-magnetic-resonance characterization on P bC center in various 4H-SiC(0001)/SiO2 interfaces
    Umeda, T.
    Nakano, Y.
    Higa, E.
    Okuda, T.
    Kimoto, T.
    Hosoi, T.
    Watanabe, H.
    Sometani, M.
    Harada, S.
    Journal of Applied Physics, 2020, 127 (14):
  • [26] Detection and Cryogenic Characterization of Defects at the SiO2/4H-SiC Interface in Trench MOSFET
    Berens, Judith
    Rasinger, Fabian
    Aichinger, Thomas
    Heuken, Michael
    Krieger, Michael
    Pobegen, Gregor
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (03) : 1213 - 1217
  • [27] First-principles investigation of point defects at 4H-SiC/SiO2 interface
    Liu Chenguang
    Wang Yuehu
    Wang Yutian
    Cheng Zhiqiang
    2018 1ST WORKSHOP ON WIDE BANDGAP POWER DEVICES AND APPLICATIONS IN ASIA (WIPDA ASIA), 2018,
  • [28] Electrically active traps at the 4H-SiC/SiO2 interface responsible for the limitation of the channel mobility
    Bassler, M
    Afanas'ev, VV
    Pensl, G
    Schulz, M
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 1065 - 1068
  • [29] Electrically active traps at the 4H-SiC/SiO2 interface responsible for the limitation of the channel mobility
    Bassler, M.
    Afanas'ev, V.V.
    Pensl, G.
    Schulz, M.
    Materials Science Forum, 2000, 338
  • [30] Observation of carbon clusters at the 4H-SiC/SiO2 interface
    Afanas'ev, VV
    Stesmans, A
    Harris, CI
    SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 857 - 860