Chemical stability of embedded material for attenuated phase-shifting mask and application of high-transmittance attenuated phase-shifting mask for 0.1 μm contact pattern in 193 nm lithography

被引：0

作者：

Lin, Cheng-Ming ^{[1
,2
]}

Loong, Wen-An ^{[1
]}

机构：

[1] E-Beam Operation Division, Taiwan Semiconductor Manufacturing Company, Ltd., Science-Based Industrial Park, Hsin-Chu 300, Taiwan

[2] Institute of Applied Chemistry, National Chiao Tung University, Hsin-Chu 300, Taiwan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2002年 / 41卷 / 6 B期

关键词：

Chemical stability;

D O I：

10.1143/jjap.41.4037

中图分类号：

学科分类号：

摘要：

引用

页码：4037 / 4041