Influence of RF substrate bias on SiO2 films prepared by ECR-PECVD

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Zhang, J.S.
Ren, Z.X.
Liang, R.Q.
Sui, Y.F.
Liu, W.
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Hejubian Yu Dengliziti Wuli/Nuclear Fusion and Plasma Physics | 2001年 / 21卷 / 01期
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