Electrostatic interference control of a high-energy coherent electron beam using three-element Boersch phase shifters

被引：0

作者：

Thakkar, Pooja ^{[1
,2
]}

Guzenko, Vitaliy A. ^{[3
]}

Lu, Peng-Han ^{[4
,5
]}

Dunin-Borkowski, Rafal E. ^{[4
,5
,6
]}

Abrahams, Jan Pieter ^{[1
,2
,7
]}

Tsujino, Soichiro ^{[1
,2
]}

机构：

[1] Paul Scherrer Insitut, Div Biol & Chem, Forschungsstr 111, CH-5232 Villigen, Switzerland

[2] Univ Basel, Swiss Nanosci Inst, Klingelbergstr 82, CH-4056 Basel, Switzerland

[3] Paul Scherrer Inst, Photon Sci Div, Forschungsstr 111, CH-5232 Villigen, Switzerland

[4] Forschungszentrum Julich, Ernst Ruska Ctr Microscopy & Spect Electrons, Wilhelm Johnen Str, D-52425 Julich, Germany

[5] Forschungszentrum Julich, Peter Grunberg Inst, Wilhelm Johnen Str, D-52425 Julich, Germany

[6] Rhein Westfal TH Aachen, Ahornstr 55, D-52074 Aachen, Germany

[7] Univ Basel, Klingelbergstr 70, CH-4056 Basel, Switzerland

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2024年 / 63卷 / 10期

关键词：

electron phase shifter; Boersch phase shifter; electron wavefront modulation; electron interference; electron holography; coherent electron beam synthesis; VORTEX BEAMS; GENERATION; PLATE; MICROSCOPY;

D O I：

10.35848/1347-4065/ad7341

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Static phase shifters have been intensely studied for generating two- and three-dimensional electron beam patterns. However, those are restricted to specific electron beam energies and microscope settings. Aiming at overcoming such limitations, the development of programmable phase shifters based on e.g. a Boersch phase is an active field of research. We recently demonstrated a three-element Boersch phase shifter device [Thakkar et al., J. Appl. Phys. 128, 134502 (2020)], which was fabricated by electron beam lithography and is compatible with up-scaling. However, it suffers from parasitic beam deflection and cross-talk. Here, we report a five-layer phase shifter device, which is based on a metal-insulator-metal-insulator-metal structure as originally envisioned by Boersch that reduces cross-talk. We demonstrate a three-element Boersch phase shifter that shows minimal beam deflection of voltage-controlled three-electron-beam interference patterns in a transmission electron microscope operated at 200 keV. The feasibility of using such multi-element phase shifter arrays is discussed in this article.

引用

页数：6

共 48 条

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