Recent advances in defect characterization in 6H-SiC using Deep Level Transient Spectroscopy and Positron Annihilation Spectroscopy

被引:0
作者
Ling, C.C. [1 ]
Beling, C.D. [1 ]
Gong, M. [2 ]
Chen, X.D. [1 ]
Fung, S. [1 ]
机构
[1] Department of Physics, University of Hong Kong, Pokfulam Road, Hong Kong, Hong Kong
[2] Department of Physics, Sichuan University, Chengdu, Sichuan 610064, China
来源
| 2000年 / Scitec Publications Ltd., Zurich卷 / 183期
关键词
Positron annihilation spectroscopy (PAS);
D O I
10.4028/www.scientific.net/ddf.183-185.1
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
[31]   Characterization of 3C-SiC monocrystals using positron annihilation spectroscopy [J].
Kerbiriou, X ;
Greddé, A ;
Barthe, MF ;
Desgardin, P ;
Blondiaux, G .
SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2, 2004, 457-460 :825-828
[32]   Defect Characterization Using Positron Annihilation Spectroscopy on Laser-Ablated Surfaces [J].
Hosemann, P. ;
Auguste, R. ;
Lam, S. ;
Butterling, M. ;
Liedke, M. O. ;
Attallah, A. G. ;
Hirschmann, E. ;
Wagner, A. ;
Grigoropoulos, C. P. ;
Selim, F. ;
Uberuaga, B. P. .
JOM, 2021, 73 (12) :4221-4230
[33]   Defect Characterization Using Positron Annihilation Spectroscopy on Laser-Ablated Surfaces [J].
P. Hosemann ;
R. Auguste ;
S. Lam ;
M. Butterling ;
M. O. Liedke ;
A. G. Attallah ;
E. Hirschmann ;
A. Wagner ;
C. P. Grigoropoulos ;
F. Selim ;
B. P. Uberuaga .
JOM, 2021, 73 :4221-4230
[34]   A comparative study of vacancies produced by proton implantation of silicon using positron annihilation and deep level transient spectroscopy [J].
Lourenço, MA ;
Knights, AP ;
Homewood, KP ;
Gwilliam, RM ;
Simpson, PJ ;
Mascher, P .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2001, 175 :300-304
[35]   Vacancy defects in as-polished and in high-fluence H+-implanted 6H-SiC detected by slow positron annihilation spectroscopy [J].
Barthe, MF ;
Desgardin, P ;
Henry, L ;
Corbel, C ;
Britton, DT ;
Kögel, G ;
Sperr, P ;
Triftshäuser, W ;
Vicente, P ;
diCioccio, L .
SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 :493-496
[36]   Vacancy defects in as-polished and in high-fluence H+-implanted 6H-SiC detected by slow positron annihilation spectroscopy [J].
Barthe, M.-F. ;
Desgardin, P. ;
Henry, L. ;
Corbel, C. ;
Britton, D.T. ;
Kögel, G. ;
Sperr, P. ;
Triftshäuser, W. ;
Vicente, P. ;
Dicioccio, L. .
Materials Science Forum, 2002, 389-393 (01) :493-496
[37]   Positron annihilation at proton-induced defects in 6H-SiC/SiC and 6H-SiC/SiO2/Si structures [J].
Barthe, MF ;
Henry, L ;
Corbel, C ;
Blondiaux, G ;
Saarinen, K ;
Hautojärvi, P ;
Hugonnard, E ;
Di Cioccio, L ;
Letertre, F ;
Ghyselen, B .
PHYSICAL REVIEW B, 2000, 62 (24) :16638-16644
[38]   High-resolution photoinduced transient spectroscopy of defect centers in undoped semi-insulating 6H-SiC [J].
Kaminski, Pawel ;
Kozlowski, Roman ;
Miczuga, Marcin ;
Pawlowski, Michal ;
Kozubal, Michal ;
Zelazko, Jaroslaw .
SILICON CARBIDE 2008 - MATERIALS, PROCESSING AND DEVICES, 2008, 1069 :33-+
[39]   Majority traps observed in H+- or He+-implanted Al-doped 6H-SiC by admittance and deep level transient spectroscopy [J].
Reshanov, SA ;
Klettke, O ;
Pensl, G .
SILICON CARBIDE AND RELATED MATERIALS - 2002, 2002, 433-4 :379-382
[40]   Infrared spectroscopy of hydrides on the 6H-SiC surface [J].
Tsuchida, H ;
Kamata, I ;
Izumi, K .
APPLIED PHYSICS LETTERS, 1997, 70 (23) :3072-3074