Integrated zero-mode waveguide nanopore chip illuminated by evanescent field

To reduce the cost and size of zero-mode waveguide lighting systems, the on-chip integration of diffraction gratings, optical waveguides, and zero-mode waveguides was designed and completed, and the micro-nanostructure and performance of the integrated chip were verified. The FDTD method was used to simulate and design the integrated chip. The on-chip diffraction grating, optical waveguide, and zero-mode waveguide array were fabricated by micro-nano machining methods, and the micro-nanostructure was characterized. A fluorescent microsphere test was performed to verify the performance of the chip. The test shows that the prepared integrated chip can realize the effective excitation of the fluorescent microsphere. The micro-nanostructure characterization shows that the diffraction grating period, tooth width, and etching depth are (352.8±2.6) nm, (155.3±2.4) nm, and (67.8±3.5) nm, respectively. The width and height of the waveguide core layer are (504.05±10.35) nm and (184.9±8.9) nm, respectively. The diameter and depth of the zero-mode waveguide are (200.2±6.4) nm and (301.3±7.6) nm, respectively, which meet the design requirements. The 22 mm× 22 mm chip, with a minimum linewidth of 155 nm, provides a compact and efficient solution for zero-mode waveguide illumination through the on-chip integration of eight diffraction gratings, approximately 1 000 optical waveguides, and hundreds of thousands of zero-mode waveguide array structures. © 2022, Chinese Institute of Electronics. All right reserved.