Redundant via insertion with cut optimization for self-aligned double patterning

被引：0

作者：

Song, Youngsoo ^{[1
,2
]}

Jung, Jinwook ^{[1
]}

Shin, Youngsoo ^{[1
]}

机构：

[1] School of Electrical Engineering, KAIST, Daejeon,34141, Korea, Republic of

[2] Samsung Electronics, Hwasung,18448, Korea, Republic of

来源：

Proceedings of the ACM Great Lakes Symposium on VLSI, GLSVLSI | 2017年 / Part F127756卷

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摘要：

1-d gridded designs - Candidate positions - Design rules - Metal layer - Optimization problems - Redundant via - Redundant via insertion - Self-aligned double patterning

引用

页码：137 / 142