Influence of the Ar:O2 molar ratio on the piezoresponse and polarization characteristics of megnetron sputtered ZnO thin films

被引:0
|
作者
Su, Lin [1 ,2 ]
Yang, Bao-He [1 ,2 ]
Wang, Fang [2 ]
Li, Cui-Ping [2 ]
Dai, Wei [1 ]
机构
[1] College of Precision Instrument and Opto-Electronics Engineering, Tianjin University, Tianjin, China
[2] Tianjin Key Laboratory of Film Electronic and Communication Devices, Tianjin University of Technology, Tianjin, China
来源
Rengong Jingti Xuebao/Journal of Synthetic Crystals | 2015年 / 44卷 / 04期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
With the same total working pressure, ZnO thin films were prepared on aluminum electrode layers by radio frequency magnetron sputtering at different Ar:O2 molar ratios. The preferred orientation, surface topography and piezoresponse were analyzed using X-ray diffraction (XRD), atom force microscopy (AFM) and piezoresponse force microscopy (PFM). The polarization characteristics of the ZnO grains were studied by vertical PFM (VPFM)and lateral PFM (LPFM) phase diagrams. The results show that the Ar:O2 molar ratio has great influence on the crystal structure and piezoelectric properties of the ZnO thin films, and among the samples, the one deposited at the Ar:O2 molar ratio of 1:1 shows the greatest VPFM amplitude and the best polarization orientation uniformity. ©, 2015, Chinese Ceramic Society. All right reserved.
引用
收藏
页码:981 / 987
相关论文
共 50 条
  • [1] Reactive sputtered ZnO thin films: Influence of the O2/Ar flow ratio on the oxygen vacancies and paramagnetic active sites
    Camacho-Berrios, Adrian A.
    Pantojas, Victor M.
    Otano, Wilfredo
    THIN SOLID FILMS, 2019, 692
  • [2] Influence of O2/Ar flow ratio on the structure and optical properties of sputtered hafnium dioxide thin films
    Liu, Wenting
    Liu, Zhengtang
    Yan, Feng
    Tan, Tingting
    Tian, Hao
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (07): : 2120 - 2125
  • [3] Microstructure and supercapacitive properties of rf-sputtered copper oxide thin films: influence of O2/Ar ratio
    Purusottam-Reddy, B.
    Sivajee-Ganesh, K.
    Jayanth-Babu, K.
    Hussain, O. M.
    Julien, C. M.
    IONICS, 2015, 21 (08) : 2319 - 2328
  • [4] Microstructure and supercapacitive properties of rf-sputtered copper oxide thin films: influence of O2/Ar ratio
    B. Purusottam-Reddy
    K. Sivajee-Ganesh
    K. Jayanth-Babu
    O. M. Hussain
    C. M. Julien
    Ionics, 2015, 21 : 2319 - 2328
  • [5] Influence of O2/Ar ratio on properties of transparent conductive tantalum-doped ZnO films
    Cao, F.
    Wang, Y.
    Liu, D.
    ELECTRONICS LETTERS, 2009, 45 (06) : 324 - 325
  • [7] Influence of O2/Ar ratio on the properties of transparent conductive niobium-doped ZnO films
    Cao Feng
    Wang YiDing
    Liu KuiXue
    Yin JingZhi
    Long BeiHong
    Li Li
    Zhang Yu
    Chen XiaMei
    CHINESE SCIENCE BULLETIN, 2009, 54 (13): : 2217 - 2220
  • [8] Effect of Ar:O2 ratio on reactively magnetron sputtered ZnO film's properties
    Ali, Zahid
    Afzal, Naveed
    Rafique, Mohsin
    MATERIALS RESEARCH EXPRESS, 2019, 6 (11):
  • [9] Influence of O2/Ar ratio on optical properties of ZAO films
    Yu, Fen
    Yan, Jinliang
    Ma, Qiuming
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2007, 28 (SUPPL.): : 153 - 156
  • [10] Effect of O2/Ar Ratio on Blue Photoluminescence Spectrum of Nanocrystalline ZnO Films
    Song Guo-li
    Fang Xiang-yun
    Liang Hong
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2010, 30 (03) : 591 - 594