Nano-oxidation of silicon nitride films with an atomic force microscope: Chemical mapping, kinetics, and applications

被引：0
|
作者：
Chien, F.S.-S.
Chou, Y.C.
Chen, T.T.
Hsieh, W.-F.
Chao, T.-S.
Gwo, S.
机构：
[1] Department of Physics, National Tsing-Hua University, Hsinchu 300, Taiwan
[2] Inst. of Electro-Optical Engineering, National Chiao-Tung University, Hsinchu 300, Taiwan
[3] National Nano Device Laboratory, 1001-1 Ta Hsueh Road, Hsinchu 300, Taiwan
[4] Center for Measurement Standards, Hsinchu 300, Taiwan
来源：
| 1600年 / American Institute of Physics Inc.卷 / 89期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Enhanced nano-oxidation on a SCl-treated Si surface using atomic force microscopy
    Moon, WC
    Yoshinobu, T
    Iwasaki, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (7A): : 4754 - 4757
  • [42] High-Voltage Nano-oxidation in Deionized Water and Atmospheric Environments by Atomic Force Microscopy
    Huang, Jen-Ching
    Chen, Chung-Ming
    SCANNING, 2012, 34 (04) : 230 - 236
  • [43] Kinetics of atomic force microscope-based scanned probe oxidation on an octadecylated silicon(111) surface
    Yang, Menglong
    Zheng, Zhikun
    Liu, Yaqing
    Zhang, Bailin
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (21): : 10365 - 10373
  • [44] Nano-topography of ultra-precision ground surface of silicon nitride ceramics using atomic force microscope
    Ichida, Yoshio
    Kishi, Kozo
    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 1992, 58 (09): : 1569 - 1574
  • [45] Local oxidation characteristics of single crystal silicon with an atomic force microscope
    Ichida, Y
    Morimoto, Y
    Sato, R
    Saito, N
    NANOTECH 2003, VOL 1, 2003, : 538 - 541
  • [46] Enhanced nano-oxidation on a SC1-treated Si surface using atomic force microscopy
    Moon, W.-C., 1600, Japan Society of Applied Physics (41):
  • [47] Kinetics and mechanism of atomic force microscope local oxidation on hydrogen-passivated silicon in inert organic solvents
    Kinser, C. Reagan
    Schmitz, Matthew J.
    Hersam, Mark C.
    ADVANCED MATERIALS, 2006, 18 (11) : 1377 - +
  • [48] MICRO/NANO-MACHINING ON SILICON SURFACE WITH A MODIFIED ATOMIC FORCE MICROSCOPE
    Zhao Qingliang
    Chinese Journal of Mechanical Engineering(English Edition), 2001, (03) : 207 - 211
  • [49] Silicon nitride cantilevers with oxidation-sharpened silicon tips for atomic force microscopy
    Grow, RJ
    Minne, SC
    Manalis, SR
    Quate, CF
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2002, 11 (04) : 317 - 321
  • [50] Micro/nano-machining on silicon surface with a modified atomic force microscope
    Zhao, Qingliang
    Sun, Tao
    Dong, Shen
    Liang, Yingchun
    Chinese Journal of Mechanical Engineering (English Edition), 2001, 14 (03): : 207 - 211
12345