Nano-oxidation of silicon nitride films with an atomic force microscope: Chemical mapping, kinetics, and applications

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作者：
Chien, F.S.-S.
Chou, Y.C.
Chen, T.T.
Hsieh, W.-F.
Chao, T.-S.
Gwo, S.
机构：
[1] Department of Physics, National Tsing-Hua University, Hsinchu 300, Taiwan
[2] Inst. of Electro-Optical Engineering, National Chiao-Tung University, Hsinchu 300, Taiwan
[3] National Nano Device Laboratory, 1001-1 Ta Hsueh Road, Hsinchu 300, Taiwan
[4] Center for Measurement Standards, Hsinchu 300, Taiwan
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| 1600年 / American Institute of Physics Inc.卷 / 89期
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