Effects of sputtering pressure on tribological properties of vanadium films on aluminum alloy by high power pulsed magnetron sputtering

被引:0
|
作者
Li, Chunwei [1 ,2 ]
Tian, Xiubo [1 ]
Liu, Tianwei [3 ]
Qin, Jianwei [3 ]
Gong, Chunzhi [1 ]
Yang, Shiqin [1 ]
机构
[1] State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China
[2] Forest Sustainable Management and Environ Microbiology Eng Heilongjiang Provincial Key Laboratory, Northeast Forestry University, Harbin 150040, China
[3] State Key Laboratory of Surface Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:1017 / 1022
相关论文
共 50 条
  • [31] Study on Vanadium Films Deposited on Concave Object by Conventional Direct Current and High Power Pulsed Magnetron Sputtering
    Li Chunwei
    Tian Xiubo
    Liu Tianwei
    Qin Jianwei
    Yang Jingjing
    Gong Chunzhi
    Yang Shiqin
    RARE METAL MATERIALS AND ENGINEERING, 2013, 42 (12) : 2437 - 2441
  • [32] Study on vanadium films deposited on concave object by conventional direct current and high power pulsed magnetron sputtering
    Li, Chunwei
    Tian, Xiubo
    Liu, Tianwei
    Qin, Jianwei
    Yang, Jingjing
    Gong, Chunzhi
    Yang, Shiqin
    Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2013, 42 (12): : 2437 - 2441
  • [33] Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering
    Ma, D. L.
    Liu, H. Y.
    Deng, Q. Y.
    Yang, W. M.
    Silins, K.
    Huang, N.
    Leng, Y. X.
    VACUUM, 2019, 160 : 410 - 417
  • [34] Effects of sputtering pressure on properties of copper oxide thin films prepared by rf magnetron sputtering
    Darma, T. H.
    Ogwu, A. A.
    Placido, F.
    MATERIALS TECHNOLOGY, 2011, 26 (01) : 28 - 31
  • [35] Effects of Sputtering Power on PtOx Films Prepared by Reactive Magnetron Sputtering
    Kang, Wenbo
    Zhu, Dongmei
    Huang, Zhibin
    Zhou, Wancheng
    Luo, Fa
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (06) : 3848 - 3852
  • [36] The adhesion and tribological properties of c-BN films deposited by high power impulse magnetron sputtering
    Efeoglu, Ihsan
    Totik, Yasar
    Keles, Aysenur
    Gulten, Gokhan
    Ersoy, Kivilcim
    Durkaya, Goksel
    CERAMICS INTERNATIONAL, 2019, 45 (03) : 3000 - 3006
  • [37] Comparison of chromium nitride thin films deposited by reactive direct current magnetron sputtering and high power pulsed magnetron sputtering
    Li, Qian
    Li, Hua
    Wang, Zheng-Duo
    Zhang, Hai-Bao
    Yang, Li-Zhen
    Liu, Zhong-Wei
    Chen, Qiang
    Surface Technology, 2019, 48 (09): : 64 - 69
  • [38] Structure and stress of Cu films prepared by high power pulsed magnetron sputtering
    Ma, D. L.
    Jing, P. P.
    Gong, Y. L.
    Wu, B. H.
    Deng, Q. Y.
    Li, Y. T.
    Chen, C. Z.
    Leng, Y. X.
    Huang, N.
    VACUUM, 2019, 160 : 226 - 232
  • [39] Cu films prepared by bipolar pulsed high power impulse magnetron sputtering
    Wu, Baohua
    Haehnlein, Ian
    Shchelkanov, Ivan
    McLain, Jake
    Patel, Dhruval
    Uhlig, Jan
    Jurczyk, Brian
    Leng, Yongxiang
    Ruzic, David N.
    VACUUM, 2018, 150 : 216 - 221
  • [40] Formation of TiOx films produced by high-power pulsed magnetron sputtering
    Stranak, Vitezslav
    Quaas, Marion
    Wulff, Harm
    Hubicka, Zdenek
    Wrehde, Stefan
    Tichy, Milan
    Hippler, Rainer
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (05)