Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters

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作者：
Marquardt, Richard [1 ]
Cipo, Julia [2 ]
Schlichting, Felix [2 ]
Kolhatkar, Gitanjali [1 ]
Kohlstedt, Hermann [1 ]
Kersten, Holger [2 ]
机构：
[1] Nanoelectronics, Faculty of Engineering, Kiel University, Kiel,24143, Germany
[2] Institute of Experimental and Applied Physics, Kiel University, Kiel,24098, Germany
来源：
Thin Solid Films | 2022年 / 742卷
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