Thickness effects in barium hexaferrite films deposited by magnetron sputtering

被引：2
|
作者：
Peng, B. [1 ]
Jiang, J.Y. [1 ]
Zhang, W.L. [1 ]
Xu, H.Z. [1 ]
Zhang, W.X. [1 ]
机构：
[1] State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu,610054, China
来源：
Materials Research Innovations | 2015年 / 19卷
关键词：
D O I：
10.1179/1432891715Z.0000000001767
中图分类号：
学科分类号：
摘要：
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页码：654 / 656
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