Predictive maintenance for improved sustainability — an Ion beam etch endpoint detection system use case

被引：0
作者：
机构：
[1] Department of Electronic Engineering, National University of Ireland, Maynooth
[2] School of Electronics, Electrical Engineering and Computer Science, Queen’s University Belfast, Belfast
[3] Seagate Technology R ®, Derry
来源：
McLoone, Seán | 1600年 / Springer Verlag卷 / 463期
关键词：
Ion BeamEtch; OES; PdM; PM; RUL;
D O I：
10.1007/978-3-662-45286-8_16
中图分类号：
学科分类号：
摘要：
In modern semiconductor manufacturing facilitiesmaintenance strategies are increasingly shifting from traditional preventive maintenance (PM) based approaches to more efficient and sustainable predictive maintenance (PdM) approaches. This paper describes the development of such an online PdM module for the endpoint detection system of an ion beam etch tool in semiconductor manufacturing. The developed system uses optical emission spectroscopy (OES) data from the endpoint detection system to estimate the RUL of lenses, a key detector component that degrades over time. Simulation studies for historical data for the use case demonstrate the effectiveness of the proposed PdM solution and the potential for improved sustainability that it affords. © Springer-Verlag Berlin Heidelberg 2014.
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页码：147 / 156
页数：9
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