Effect of negative bias on deposition of TiN/TiCN multilayer films by arc ion plating

被引：0
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作者：
Huang, M. [1 ]
Lin, G. [1 ]
Dong, C. [1 ]
Sun, C. [1 ]
Jiang, C. [1 ]
Huang, R. [1 ]
Wen, L. [1 ]
机构：
[1] State Key Lab. of Mat. Modification, Dalian University of Technology, Dalian 116024, China
来源：
Jinshu Rechuli/Heat Treatment of Metals | 2001年 / 26卷 / 07期
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页码：17 / 20
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