共 50 条
- [11] New extreme ultraviolet irradiation and multilayer evaluation system for extreme ultraviolet lithography mirror contamination in the NewSUBARU JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5373 - 5377
- [12] Modeling extreme ultraviolet ablation interactions OPTICS DAMAGE AND MATERIALS PROCESSING BY EUV/X-RAY RADIATION VII, 2019, 11035
- [13] Interaction of benzene with TiO2 surfaces: Relevance to contamination of extreme ultraviolet lithography mirror capping layers JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (06): : 2241 - 2246
- [17] Contamination Concerns at the Intermediate Focus of an Extreme Ultraviolet Light Source EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV, 2013, 8679
- [19] Modeling extreme ultraviolet suppression of electrostatic analyzers REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (04):