Image contrast of projection electron-beam lithography with demagnification imaging (PELDI)

被引:0
|
作者
Peng, Kai-Wu
Gu, Wen-Qi
Zhang, Fu-An
Wu, Gui-Jun
机构
来源
Weixi Jiagong Jishu/Microfabrication Technology | 2002年 / 03期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Proof-of-concept system for projection electron-beam lithography with demagnification imaging (PELDI)
    Peng, Kai-Wu
    Gu, Wen-Qi
    Wu, Gui-Jun
    Zhang, Fu-An
    Weixi Jiagong Jishu/Microfabrication Technology, 2001, (04):
  • [2] Technology of adjusting the projection electron-beam lithography with demagnification imaging
    Peng, Kai-Wu
    Zhang, Fu-An
    Gu, Wen-Qi
    Weixi Jiagong Jishu/Microfabrication Technology, 2002, (04):
  • [3] Mask characteristics for projection electron-beam lithography with demagnification imaging
    Peng, KW
    Zhang, F
    Wu, GJ
    Gu, WQ
    Sun, X
    Kang, NK
    Pu, QR
    Ding, ZJ
    MICROELECTRONIC ENGINEERING, 2002, 61-2 : 277 - 283
  • [4] CHOICE OF SYSTEM PARAMETERS FOR PROJECTION ELECTRON-BEAM LITHOGRAPHY - ACCELERATING VOLTAGE AND DEMAGNIFICATION FACTOR
    LIDDLE, JA
    BERGER, SD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2776 - 2779
  • [5] Contrast limitations in electron-beam lithography
    Crandall, R
    Hofmann, U
    Lozes, RL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2945 - 2947
  • [6] Fabrication of masks for electron-beam projection lithography
    Lercel, M
    Magg, C
    Barrett, M
    Collins, K
    Trybendis, M
    Caldwell, N
    Jeffer, R
    Bouchard, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3210 - 3215
  • [7] PROJECTION ELECTRON-BEAM LITHOGRAPHY - A NEW APPROACH
    BERGER, SD
    GIBSON, JM
    CAMARDA, RM
    FARROW, RC
    HUGGINS, HA
    KRAUS, JS
    LIDDLE, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2996 - 2999
  • [8] Stencil masks for electron-beam projection lithography
    Kurihara, K
    Iriguchi, H
    Motoyoshi, A
    Tabata, T
    Takahashi, S
    Iwamoto, K
    Okada, I
    Yoshihara, H
    Noguchi, H
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII, 2001, 4409 : 726 - 733
  • [9] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, JA
    Watson, GP
    Berger, SD
    Miller, PD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6672 - 6678
  • [10] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, J.Alexander
    Watson, G.Patrick
    Berger, Steven D.
    Miller, Peter D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6672 - 6678