Ion nitriding of tantalum and niobium alloys

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作者：

MGTU im. N.E. Baumana, Moscow, Russia ^{[1
]}

机构：

来源：

Metallovedenie i Termicheskaya Obrabotka Metallov | 2002年 / 10期

关键词：

Diffusion coatings - Glow discharges - Hardness - High temperature effects - Lattice constants - Niobium - Pressure effects - Saturation (materials composition) - Tantalum;

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摘要：

The glow discharge is used for ion nitriding Nb and Ta at 700-1000°C and N pressure of 0.4-20 gPa. Microstructure of diffusion layers and their microhardness are investigated. The nitride and diffusion zones are revealed. The parameters of crystal lattices of all nitride phases formed are determined. It is shown that the high hardness of diffusion zone is caused by both solid solution hardening and structure heterogenizing due to great amount of dispersed particles of MN0.04 phase type. The technology provides increasing in high-temperature strength of tubular parts by 2-2.5 times.

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