Cluster magnetorheological effect plane polishing technology

被引：19

|

作者：

Pan, Jisheng ^{[1
]}

Yan, Qiusheng ^{[1
]}

Lu, Jiabin ^{[1
]}

Xu, Xipeng ^{[2
]}

Chen, Senkai ^{[1
]}

机构：

[1] School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China

[2] Engineering Research Center for Brittle Materials Machining, Huaqiao University, Xiamen 361021, China

来源：

Jixie Gongcheng Xuebao/Journal of Mechanical Engineering | 2014年 / 50卷 / 01期

关键词：

Silicon wafers;

D O I：

10.3901/JME.2014.01.205

中图分类号：

学科分类号：

摘要：

引用

收藏

页码：205 / 212

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