Microstructure study of fluorinated amorphous carbon films by Raman and Fourier transform infrared spectroscopy

被引：0
|
作者：
Xiao J. [1 ,2 ,3 ]
Jiang A. [2 ]
机构：
[1] School of Metallurgical Science and Engineering, Central South University
[2] Department of Physics and Maths, Guilin University of Technology
[3] Guangxi Key Laboratory of Information Materials, Guilin Univrersity of Electronic Technology
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2010年 / 30卷 / 06期
关键词：
Annealing; Discharge power; Fluorinated amorphous carbon films; Raman spectra;
D O I：
10.3969/j.issn.1672-7126.2010.06.22
中图分类号：
学科分类号：
摘要：
The fluorinated amorphous carbon (a-C:F) films were grown by DC magnetron sputtering on Si substrates. The impacts of film growth conditions, including the sputtering power, pressure, and annealing temperature, on its quality were evaluated. The microstructures and sp2 hybridization of the films were characterized with Raman spectroscopy, Fourier transform infrared spectroscopy, and atomic force microscopy. The spectra were analyzed with Lorentzian data-fitting. The results show that the annealing temperature and sputtering power strongly affect the microstructures of the films. For instance, the density of sp2 hybridization increases with the increases of both the annealing temperature and sputtering power. At 350 °C, graphite phase considerably increased.
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页码：685 / 689
页数：4
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