Influence of external stress on surface reaction dynamics

被引：23

作者：

Uesugi-Saitow, Yuki ^{[1
]}

Yata, Masanori ^{[1
]}

机构：

[1] National Inst. for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

来源：

Physical Review Letters | 2002年 / 88卷 / 25 I期

关键词：

Activation energy - Charge transfer - Chemisorption - Copper - Dissociation - Gas adsorption - Low energy electron diffraction - Molecular beam epitaxy - Oxygen - Plastic deformation - Poisson ratio - Tensile stress - Thin films;

D O I：

10.1103/PhysRevLett.88.256104

中图分类号：

学科分类号：

摘要：

The effect of stress on two adsorption processes of oxygen on clean Cu(001) and O-covered Cu(001) surfaces was studied. It was demonstrated that the chemisorption of oxygen was sensitive to uniaxial tensile stress within an elastic limit. It was found that stress enhances the dissociative chemisorption on clean Cu(001) when the translational energy of incident oxygen is below 250 meV and supresses it when the energy is above 250 meV. The effect of external stress on the oxygen dissociation dynamics was found to be different between clean and O-covered surfaces.

引用

页码：256104 / 256104

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