Ion-beam Assisted Magnetron Sputtering Deposition of Titanium Nitride Films

被引：0
|
作者：
He, Huang
Xuegang, Wang
Xiaodong, Zhu
Hua, Chen
Jiawen, He
机构：
[1] Xi'an Jiaotong University, Xi'an 710049, China
[2] Sch. of Mat. Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2002年 / 31卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Phase composition and crystalline structure of titanium nitride deposited on silicon by an ion-beam assisted deposition technique
    Yokota, K
    Nakamura, K
    Kasuya, T
    Ohnishi, M
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 386 - 389
  • [42] Compact hydrogenated amorphous germanium films by ion-beam sputtering deposition
    Comedi, D
    Dondeo, F
    Chambouleyron, I
    Peng, ZL
    Mascher, P
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 713 - 716
  • [43] DEPOSITION OF FERROMAGNETIC METAL THIN-FILMS BY ION-BEAM SPUTTERING
    ISHII, K
    NAOE, M
    YAMANAKA, S
    IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) : 1830 - 1832
  • [44] SILICON-NITRIDE LAYERS ON TOOL STEEL PRODUCED BY ION-BEAM MIXING AND ION-BEAM ASSISTED DEPOSITION
    HENSEL, E
    SOMMER, H
    KNOTHE, P
    RICHTER, E
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1989, 112 (02): : 533 - 539
  • [45] ION-BEAM ANALYSIS OF CONTAMINANTS IN PLASMA DEPOSITED TITANIUM NITRIDE FILMS
    HIRVONEN, JP
    LAPPALAINEN, R
    ANTTILA, A
    SIRVIO, E
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 721 - 728
  • [46] DEPOSITION AND EVALUATION OF THIN-FILMS BY DC ION-BEAM SPUTTERING
    SCHMIDT, PH
    SPENCER, EG
    CASTELLANO, RN
    SOLID STATE TECHNOLOGY, 1972, 15 (07) : 27 - +
  • [47] OPTICAL AND MECHANICAL-PROPERTIES OF CARBON NITRIDE FILMS PREPARED BY ION-ASSISTED ARE DEPOSITION AND MAGNETRON SPUTTERING
    WANG, X
    MARTIN, PJ
    KINDER, TJ
    THIN SOLID FILMS, 1995, 256 (1-2) : 148 - 154
  • [48] Deposition of titanium nitride thin films onto Silicon by RF Reactive magnetron sputtering
    Saoula, N.
    Henda, K.
    Kesri, R.
    THIN FILMS AND POROUS MATERIALS, 2009, 609 : 117 - +
  • [49] STRUCTURE AND OPTICAL-PROPERTIES OF TIN FILMS PREPARED BY DC SPUTTERING AND BY ION-BEAM ASSISTED DEPOSITION
    BONELLI, M
    GUZMAN, LA
    MIOTELLO, A
    CALLIARI, L
    ELENA, M
    OSSI, PM
    VACUUM, 1992, 43 (5-7) : 459 - 462
  • [50] ION-BEAM ASSISTED DEPOSITION OF EVAPORATED THIN SILVER FILMS
    BURAT, O
    STAMBOULI, V
    BOUCHIER, D
    GAUTHERIN, G
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1989, 44 (245): : 65 - 67
12345