Fabrication of large-angle diffractive optical element based on nanoimprint lithography

被引：0

作者：

Liu X. ^{[1
]}

Zhang M. ^{[1
]}

Pang H. ^{[1
]}

Shi L.-F. ^{[1
]}

Cao A.-X. ^{[1
]}

Deng Q.-L. ^{[1
]}

机构：

[1] Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu

来源：

Guangzi Xuebao/Acta Photonica Sinica | 2016年 / 45卷 / 06期

基金：

中国国家自然科学基金;

关键词：

Diffractive Optical elements; Low cost; Mass production; Nanoimprint lithography; Nanometer scale;

D O I：

10.3788/gzxb20164506.0605001

中图分类号：

学科分类号：

摘要：

In order to fabricate the large-angle (more than 50°) diffractive optical elements with low cost and mass preparation, a fabrication method base on nanoimprint lithography was proposed. A diffractive optical elements master mold was prepared via conventional photolithography or electron beam lithography. The mold was then imprinted onto the nanoimprint resist with quartz substrate. The structure was transferred to the resist and the diffractive optical elements were achieved. In contrast to other techniques, the nanoimprint mold can be repeatedly used to lower production cost and improve the efficiency. Based on the method, diffractive optical elements with different feature sizes (minimum 250 nm, diffractive angle 70°) were fabricated for different diffractive patterns, which has a good diffractive efficiency, realizing high-fidelity replication of relief structure with high aspect ratio. The technology can fabricate diffraction optical elements from micron to nanometer scale with high fidelity, low cost and mass production. © 2016, Science Press. All right reserved.

引用

页数：5

共 26 条

[1]

Herrera-Femandez J.M., Sanchez-Brea L.M., Double diffractive optical element system for near-field shaping, Applied Optics, 50, 23, pp. 4587-4593, (2011)

[2]

Jesacher A., Bemet S., Ritsch-Marte M., Colour hologram projection with an SLM by exploiting its full phase modulation range, Optics Express, 22, 17, pp. 20530-20541, (2014)

[3]

Pang H., Yin S.-Y., Deng Q.-L., Et al., A novel method for the design of diffractive optical elements based on the Rayleigh-Sommerfeld integral, Optics & Lasers in Engineering, 70, pp. 38-44, (2015)

[4]

Meng J.-Q., Diffractive optics and its application in infrared imaging systems, Aero Weaponry, 6, pp. 38-41, (2006)

[5]

Abdalati W., Zwally H.J., Bindschadleret R., Et al., The ICES at-2 laser altimetry mission, Proceedings of the Institute of Electrical and Electronics Engineers, 98, 5, pp. 735-751, (2010)

[6]

Zhang W.-G., Zhao H., Zhang Q., Et al., Calibration method for three-dimensional measurement system based on linear-structure light, Chinese Journal Lasers, 36, 1, pp. 182-188, (2009)

[7]

Yoo S., Song H.Y., Lee J., Et al., Cost-effective large-scale fabrication of diffractive optical elements by using conventional semiconducting processes, Applied Optics, 51, 33, pp. 8052-8056, (2012)

[8]

Yu B., Li H., Chen D.-N., Et al., Design, fabrication, and experimental demonstration of a diffractive optical element with long depth of field for nanoscale three-dimensional multi-molecule tracking, Acta Physica Sinica, 62, 15, (2013)

[9]

Shinonaga Y., Ogino K., Unno N., Et al., Fabrication of eight-step diffractive optical element for hologram-ROM, Microelectronic Engineering, (2015)

[10]

Xie Y., Lu Z., Li F., Et al., Lithographic fabrication of large diffractive optical elements on a concave lens surface, Optics Express, 10, 20, pp. 1043-1047, (2002)

← 1 2 3 →