Highly anisotropic etching of polysilicon by time-modulation bias

被引：0
|
作者：
Ono, Tetsuo [1 ]
Mizutani, Tatsumi [1 ]
Goto, Yasushi [2 ]
Kure, Tokuo [2 ]
机构：
[1] Kasado Works, Hitachi, Ltd., Kudamatsu, Yamaguchi 744, Japan
[2] Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 08期
关键词：
D O I：
10.1143/jjap.39.5003
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：5003 / 5009
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