Deposition rate simulation of unbalanced magnetron sputtering

被引:0
|
作者
Hosokawa, Yoshiyuki
机构
来源
| 2002年 / Kobe Steel Ltd卷 / 52期
关键词
Balanced magnetron sputtering - Deposition rate - Target erosion - Unbalanced magnetron sputtering;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:35 / 38
相关论文
共 50 条
  • [1] The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system
    Kelly, PJ
    Arnell, RD
    SURFACE & COATINGS TECHNOLOGY, 1998, 108 (1-3): : 317 - 322
  • [2] Deposition of amorphous thin films by unbalanced magnetron sputtering
    Hsieh, JH
    Tan, BH
    Liu, YC
    Zeng, XT
    PROCESSING AND FABRICATION OF ADVANCED MATERIALS VI, VOLS 1 & 2, 1998, : 1209 - 1218
  • [3] DEPOSITION OF COPPER-FILMS BY UNBALANCED DC MAGNETRON SPUTTERING
    MUSIL, J
    BELL, AJ
    CEPERA, M
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1995, 45 (03) : 249 - 261
  • [4] The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering
    Kelly, PJ
    AbuZeid, OA
    Arnell, RD
    Tong, J
    SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3): : 28 - 32
  • [5] Deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering
    Kelly, P.J.
    Abu-Zeid, O.A.
    Arnell, R.D.
    Tong, J.
    Surface and Coatings Technology, 1996, 86-87 (1 -3 pt 1) : 28 - 32
  • [6] Preparation of CNx films using unbalanced magnetron sputtering deposition
    Gao, P.
    Liu, C.
    Wu, D.
    Peng, Y.
    Fan, X.
    Wuhan Daxue Xuebao/Journal of Wuhan University, 2001, 47 (01): : 99 - 102
  • [7] ION-ASSISTED DEPOSITION IN UNBALANCED-MAGNETRON SPUTTERING SYSTEMS
    SPROUL, WD
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1993, 163 (02): : 187 - 192
  • [8] Ion-assisted deposition in unbalanced-magnetron sputtering systems
    Sproul, William D.
    Materials Science and Engineering A, 1993, A163 (02) : 187 - 192
  • [9] Deposition of YBCO thin film with buffer layer by unbalanced magnetron sputtering
    Latief, C
    Barmawi, M
    THIRD INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 1998, 3175 : 196 - 199
  • [10] REACTIVE SPUTTERING WITH AN UNBALANCED MAGNETRON
    HOWSON, RP
    JAFER, HA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1784 - 1790