Effect of oxygen radical in hydrophilization treatment of polyimide using ar-o2 mixture gas surface wave plasma

被引：0

作者：

Hirukawa, Yoshinari ^{[1
]}

Ono, Shigeru ^{[1
]}

机构：

[1] Tokyo City University 1-28-1, Tamatsutsumi

来源：

| 1600年 / Institute of Electrical Engineers of Japan卷 / 134期

基金：

日本学术振兴会;

关键词：

Electron density; Electron temperature; Oxygen radical density; Polyimide; Surface modification; Surface wave plasma;

D O I：

10.1541/ieejfms.134.91

中图分类号：

学科分类号：

摘要：

Hydrophilic treatment of polyimide has been investigated using Ar-O2 mixture gas surface wave plasma apparatus. As results, sufficient hydrophilic treatment has been observed in the position well away from a dielectric plate for surface wave plasma generation. Spatial distribution of electron temperature and electron density showed the rapid decrease with increasing distance from the dielectric plate. However, catalytic probe measurement of atomic oxygen radical density showed the high oxygen radical density in the position well away from the dielectric plate. Hydrophilic treatment experiment was conducted at different two positions by adjusting treatment time to accomplish same oxygen radical amount reaching. Water contact angle of these two treated sample showed good agreement. Important contribution of the atomic oxygen radical in the downstream region of surface wave plasma had been shown through the hydrophilic processing experiment of polyimide. © 2014 The Institute of Electrical Engineers of Japan.

引用

页码：91 / 97+4

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