Structure analyses of Ti-based self-formed barrier layers

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Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan [1 ]
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Jpn. J. Appl. Phys. | / 4 PART 2卷
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Compilation and indexing terms; Copyright 2024 Elsevier Inc;
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摘要
Dielectric materials - Silica - Titanium dioxide - Crystalline materials - Tin oxides - Indium compounds - Metallic films - Copper alloys - X ray photoelectron spectroscopy - Titanium nitride
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