Component optimization of polishing slurry on chemical mechanical planarization of cobalt contact

被引：0
|
作者：
Tian, Qi-Yuan [1 ]
Wang, Sheng-Li [1 ]
Xiao, Yue [1 ]
Wang, Chen-Wei [1 ]
Liu, Feng-Xia [1 ]
Liang, Ting-Wei [1 ]
机构：
[1] School of Electronic Information Engineering, Hebei University of Technology, Tianjin,300130, China
来源：
Surface Technology | 2018年 / 47卷 / 09期
关键词：
D O I：
10.16490/j.cnki.issn.1001-3660.2018.09.036
中图分类号：
学科分类号：
摘要：
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页码：272 / 278
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