High-temperature oxidation of intermetallics based on Ti-Al-Si system

被引：0
作者：
Knaislová A. [1 ]
Šimůnková V. [1 ]
Novák P. [1 ]
机构：
[1] Department of Metals and Corrosion Engineering, University of Chemistry and Technology Prague, Technická 5, Prague
来源：
Knaislová, Anna (knaisloa@vscht.cz) | 2018年 / Jan-Evangelista-Purkyne-University卷 / 18期
关键词：
Intermetallics; Parabolic constant; Reactive sintering; Thermal stability;
D O I：
10.21062/ujep/87.2018/a/1213-2489/MT/18/2/255
中图分类号：
学科分类号：
摘要：
Ti-Al-Si alloys excel with their low density and good resistance against high-temperature oxidation in comparison with so far commonly used nickel alloys. Silicon in Ti-Al-Si alloys has significant positive effect on hightemperature oxidation due to increasing adhesion of oxide layer. The TiAl20Si20 alloy was evaluated as the best alloy from tested ones, because its oxide layer protected very well the basic material and TiAl20Si20 achieved good hardness after 400 hours of annealing. © 2018. Published by Manufacturing Technology.
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页码：255 / 258
页数：3
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