Influence of plasma treatment on optical and damage properties of TiO2 thin films

被引：2

作者：

Mao S.-D. ^{[1
]}

Zou Y.-G. ^{[1
]}

Fan J. ^{[1
]}

Lan Y.-P. ^{[1
]}

Wang H.-Z. ^{[1
]}

Zhang J.-B. ^{[1
]}

Dong J.-N. ^{[1
]}

Ma X.-H. ^{[1
]}

机构：

[1] State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology, Changchun

来源：

Guangxue Jingmi Gongcheng/Optics and Precision Engineering | 2019年 / 27卷 / 07期

关键词：

Electron beam evaporation; Laser damage threshold; Optical constant; Plasma treatment; TiO[!sub]2[!/sub] thin film;

D O I：

10.3788/OPE.20192707.1451

中图分类号：

学科分类号：

摘要：

To improve the optical properties and laser damage threshold of TiO2 films and to ensure their wider use and greater stability in lasers, TiO2 films were deposited on K9 glass using electron beam evaporation technology, and the samples were post-treated with Ar/O mixed plasma. The effects of plasma post-treatment time on the laser damage characteristics of TiO2 thin films were analyzed by measuring the film spectral characteristics, surface defect density, surface topography, damage threshold, and damage topography. The experimental results showed that the refractive index and fill density of the films increased with increasing post-treatment time, whereas the physical thickness and surface roughness decreased. In addition, the surface defect density first decreased and then increased. After a 20-min post-treatment, the LIDT of the TiO2 film samples increased from 5.6 to 9.65 J/cm2 under a 1 064-nm laser irradiation, representing an increase of 72.3%. © 2019, Science Press. All right reserved.

引用

页码：1451 / 1457

页数：6

共 17 条

[1]

Ling X.L., Liu X.F., Wang G., Et al., Influence of oxygen partial pressure on laser-induced damage resistance of ZrO2 films in vacuum, Vacuum, 119, pp. 145-150, (2015)

[2]

Mikami K., Motokoshi S., Somekawa T., Et al., A theoretical analysis for temperature dependences of laser-induced damage threshold, SPIE Laser Damage, (2013)

[3]

Gao W.D., Zhang W.L., Fan S.H., Et al., Effects of the structure of HfO2 thin films on its laser-induced damage threshold, Acta Photonica Sinica, 34, 2, pp. 176-179, (2005)

[4]

Jena S., Tokas R.B., Thakur S., Et al., Influence of annealing on optical, microstructural and laser induced damage properties of TiO2/SiO2 multilayer high reflection mirror, Bhubaneswar, pp. 4356-4364, (2017)

[5]

Luo Y., Hu G.H., Zhao Y.A., Et al., Improvement of laser damage resistance at surface of DKDP crystal by laser conditioning process, Opt. Precision Eng., 25, 8, pp. 1987-1994, (2017)

[6]

Wu Q., Luo J., Pan F., Effects of posttreatments on optical properties and laser induced damage thresholds of HfO2 thin films, Opt. Precision Eng., 24, 12, pp. 3000-3004, (2016)

[7]

Xiao Q.L., Wang C.J., Shao S.Y., Et al., Influences of deposition methods and ion post-treatment technique on residual stress of HfO2 films, Acta Photonica Sinica, 37, pp. 249-253, (2009)

[8]

Pan Y.Q., Hang L.X., Wu Z.S., Et al., Influence of ion beam post-treatment on surface roughness of TiO2 thin films, Chinese Journal of Lasers, 37, 4, pp. 1108-1113, (2010)

[9]

Duan Y.L., Xu S., Ba D.C., Et al., Effect of ion beam post-treatment on optical properties of TiO2 thin films, Vacuum, 45, 1, pp. 31-33, (2008)

[10]

Anuradha B., ISO 11254: an international standard for the determination of the laser-induced damage threshold, 2114, 3, pp. 170-175, (1994)

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