Reactive Deposition Epitaxy of CoSi2 Films on Clean and Oxygen-Adsorbed Si(001) Surfaces

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作者：
Hayashi, Yukihiro [1 ,2 ]
Sakai, Akira [1 ]
Ikeda, Hiroya [1 ,4 ]
Zaima, Shigeaki [3 ]
Yasuda, Yukio [1 ]
机构：
[1] Dept. of Crystalline Mat. Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
[2] Electronics Department, Nagoya Municipal Indust. Res. Inst., 3-4-41 Rokuban, Atsuta-ku, Nagoya 456-0058, Japan
[3] Ctr. Coop. Res. Adv. Sci./Technol., Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
[4] Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8011, Japan
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| 1600年 / Japan Society of Applied Physics卷 / 42期
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