Accurate thickness determination of ultrathin silicon oxide film by x-ray photoelectron spectroscopy

被引：0
|
作者：
Takahashi, K. [1 ]
Nakamura, T. [1 ]
Nohira, H. [1 ]
Hirose, K. [1 ]
Hattori, T. [1 ]
机构：
[1] Dept. of Elec. and Electronic Eng., Musashi Institute of Technology, 1-28-1 Tamazutsumi, Setagaya-ku, Tokyo 158-8557, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 2001年 / 44卷 / 08期
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D O I：
10.3131/jvsj.44.715
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学科分类号：
摘要：
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页码：715 / 719
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