Image formation by continuous writing with multi-beam in X-ray nanolithography

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作者：
Advanced Research Institute for Science and Engineering, Waseda University, 3-4-1, Okubo, Shinjuku-ku [1 ]
Tokyo
169-8555, Japan
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来源：
Int. Microprocess. Nanotechnol. Conf., MNC | 2001年 / 140-141期
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摘要：
X ray lithography - Nanotechnology
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